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|a 10.1002/adma.201670163
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|a eng
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|a Ogier, Robin
|e verfasserin
|4 aut
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|a Metasurfaces
|b Continuous-Gradient Plasmonic Nanostructures Fabricated by Evaporation on a Partially Exposed Rotating Substrate (Adv. Mater. 23/2016)
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|c 2016
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|a Text
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|a ƒaComputermedien
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|a Date Completed 17.07.2018
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|a Date Revised 01.10.2020
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|a published: Print
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|a Citation Status PubMed-not-MEDLINE
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|a © 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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|a A continuous-gradient approach of material evaporation is employed by L. Shao, M. Käll, and co-workers to fabricate nanostructures with varying geometric parameters such as thickness, lateral positioning, and orientation on a single substrate. This method for mask lithography, described on page 4658, allows continuous tuning of the physical properties of a sample. The technique is highly valuable in simplifying the overall optimization process for constructing metasurfaces
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|a Journal Article
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|a continuous parameter tuning
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|a electron-beam evaporation
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|a gradient metasurfaces
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|a hole-mask colloidal lithography
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|a plasmonic nanostructures
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|a Shao, Lei
|e verfasserin
|4 aut
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1 |
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|a Svedendahl, Mikael
|e verfasserin
|4 aut
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| 700 |
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|a Käll, Mikael
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|t Advanced materials (Deerfield Beach, Fla.)
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|g 28(2016), 23 vom: 06. Juni, Seite 4756
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