Metasurfaces : Continuous-Gradient Plasmonic Nanostructures Fabricated by Evaporation on a Partially Exposed Rotating Substrate (Adv. Mater. 23/2016)
© 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
| Publié dans: | Advanced materials (Deerfield Beach, Fla.). - 1998. - 28(2016), 23 vom: 06. Juni, Seite 4756 |
|---|---|
| Auteur principal: | |
| Autres auteurs: | , , |
| Format: | Article en ligne |
| Langue: | English |
| Publié: |
2016
|
| Accès à la collection: | Advanced materials (Deerfield Beach, Fla.) |
| Sujets: | Journal Article continuous parameter tuning electron-beam evaporation gradient metasurfaces hole-mask colloidal lithography plasmonic nanostructures |
| Résumé: | © 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. A continuous-gradient approach of material evaporation is employed by L. Shao, M. Käll, and co-workers to fabricate nanostructures with varying geometric parameters such as thickness, lateral positioning, and orientation on a single substrate. This method for mask lithography, described on page 4658, allows continuous tuning of the physical properties of a sample. The technique is highly valuable in simplifying the overall optimization process for constructing metasurfaces |
|---|---|
| Description: | Date Completed 17.07.2018 Date Revised 01.10.2020 published: Print Citation Status PubMed-not-MEDLINE |
| ISSN: | 1521-4095 |
| DOI: | 10.1002/adma.201670163 |