Parallel Stitching of 2D Materials

Parallel Stitching of 2D Materials

© 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 28(2016), 12 vom: 23. März, Seite 2322-9
1. Verfasser: Ling, Xi (VerfasserIn)
Weitere Verfasser: Lin, Yuxuan, Ma, Qiong, Wang, Ziqiang, Song, Yi, Yu, Lili, Huang, Shengxi, Fang, Wenjing, Zhang, Xu, Hsu, Allen L, Bie, Yaqing, Lee, Yi-Hsien, Zhu, Yimei, Wu, Lijun, Li, Ju, Jarillo-Herrero, Pablo, Dresselhaus, Mildred, Palacios, Tomás, Kong, Jing
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2016
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article MoS2 heterostructure intergrated circuits synthesis two-dimensional materials
Beschreibung
Zusammenfassung:© 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Diverse parallel stitched 2D heterostructures, including metal-semiconductor, semiconductor-semiconductor, and insulator-semiconductor, are synthesized directly through selective "sowing" of aromatic molecules as the seeds in the chemical vapor deposition (CVD) method. The methodology enables the large-scale fabrication of lateral heterostructures, which offers tremendous potential for its application in integrated circuits
Beschreibung:Date Completed 25.07.2016
Date Revised 01.10.2020
published: Print-Electronic
Citation Status PubMed-not-MEDLINE
ISSN:1521-4095
DOI:10.1002/adma.201505070