Distortion of Ultrathin Photocleavable Block Copolymer Films during Photocleavage and Nanopore Formation
Highly ordered block copolymer thin films have been studied extensively during the last years because they afford versatile self-assembled morphologies via a bottom-up approach. They promise to be used in applications such as polymeric membranes or templates for nanostructured materials. Among the b...
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Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 31(2015), 32 vom: 18. Aug., Seite 8947-52
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| 1. Verfasser: |
Altinpinar, Sedakat
(VerfasserIn) |
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| Weitere Verfasser: |
Zhao, Hui,
Ali, Wael,
Kappes, Ralf S,
Schuchardt, Patrick,
Salehi, Sahar,
Santoro, Gonzalo,
Theato, Patrick,
Roth, Stephan V,
Gutmann, Jochen S |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2015
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article |
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