Distortion of Ultrathin Photocleavable Block Copolymer Films during Photocleavage and Nanopore Formation

Highly ordered block copolymer thin films have been studied extensively during the last years because they afford versatile self-assembled morphologies via a bottom-up approach. They promise to be used in applications such as polymeric membranes or templates for nanostructured materials. Among the b...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 31(2015), 32 vom: 18. Aug., Seite 8947-52
1. Verfasser: Altinpinar, Sedakat (VerfasserIn)
Weitere Verfasser: Zhao, Hui, Ali, Wael, Kappes, Ralf S, Schuchardt, Patrick, Salehi, Sahar, Santoro, Gonzalo, Theato, Patrick, Roth, Stephan V, Gutmann, Jochen S
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2015
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article
LEADER 01000naa a22002652 4500
001 NLM250759055
003 DE-627
005 20231224160518.0
007 cr uuu---uuuuu
008 231224s2015 xx |||||o 00| ||eng c
024 7 |a 10.1021/acs.langmuir.5b00750  |2 doi 
028 5 2 |a pubmed24n0835.xml 
035 |a (DE-627)NLM250759055 
035 |a (NLM)26161944 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
100 1 |a Altinpinar, Sedakat  |e verfasserin  |4 aut 
245 1 0 |a Distortion of Ultrathin Photocleavable Block Copolymer Films during Photocleavage and Nanopore Formation 
264 1 |c 2015 
336 |a Text  |b txt  |2 rdacontent 
337 |a ƒaComputermedien  |b c  |2 rdamedia 
338 |a ƒa Online-Ressource  |b cr  |2 rdacarrier 
500 |a Date Completed 26.10.2015 
500 |a Date Revised 18.08.2015 
500 |a published: Print-Electronic 
500 |a Citation Status PubMed-not-MEDLINE 
520 |a Highly ordered block copolymer thin films have been studied extensively during the last years because they afford versatile self-assembled morphologies via a bottom-up approach. They promise to be used in applications such as polymeric membranes or templates for nanostructured materials. Among the block copolymer structures, perpendicular cylinders have received strong attention due to their ability to fabricate highly ordered nanopores and nanowires. Nanopores can be created from a thin block copolymer film upon the removal of one block by selective etching or by dissolution of one polymer block. Here we demonstrate the utilization of polystyrene-block-poly(ethylene oxide) diblock copolymer (PS-hν-PEO) with an ortho-nitrobenzyl ester (ONB) as the photocleavable block-linker to create highly ordered thin films. Removal of the PEO block by choosing an appropriate solvent upon photocleavage is expected to yield arrays of nanopores decorated with functional groups, thus lending itself to adsorption or filtration uses. While the feasibility of this approach has been demonstrated, it is crucial to understand the influence of removal conditions (i.e., efficiency of photocleavage as well as best washing solvent) and to evaluate changes in the surface topology and inner structure upon photocleavage. To this end, the time dependence evolution of the surface morphology of block copolymer thin films was studied using grazing-incidence small-angle X-ray scattering (GISAXS) technique in combination with scanning probe microscopy 
650 4 |a Journal Article 
700 1 |a Zhao, Hui  |e verfasserin  |4 aut 
700 1 |a Ali, Wael  |e verfasserin  |4 aut 
700 1 |a Kappes, Ralf S  |e verfasserin  |4 aut 
700 1 |a Schuchardt, Patrick  |e verfasserin  |4 aut 
700 1 |a Salehi, Sahar  |e verfasserin  |4 aut 
700 1 |a Santoro, Gonzalo  |e verfasserin  |4 aut 
700 1 |a Theato, Patrick  |e verfasserin  |4 aut 
700 1 |a Roth, Stephan V  |e verfasserin  |4 aut 
700 1 |a Gutmann, Jochen S  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Langmuir : the ACS journal of surfaces and colloids  |d 1992  |g 31(2015), 32 vom: 18. Aug., Seite 8947-52  |w (DE-627)NLM098181009  |x 1520-5827  |7 nnns 
773 1 8 |g volume:31  |g year:2015  |g number:32  |g day:18  |g month:08  |g pages:8947-52 
856 4 0 |u http://dx.doi.org/10.1021/acs.langmuir.5b00750  |3 Volltext 
912 |a GBV_USEFLAG_A 
912 |a SYSFLAG_A 
912 |a GBV_NLM 
912 |a GBV_ILN_22 
912 |a GBV_ILN_350 
912 |a GBV_ILN_721 
951 |a AR 
952 |d 31  |j 2015  |e 32  |b 18  |c 08  |h 8947-52