Centimeter-scale subwavelength photolithography using metal-coated elastomeric photomasks with modulated light intensity at the oblique sidewalls
By coating polydimethylsiloxane (PDMS) relief structures with a layer of opaque metal such as gold, the incident light is strictly allowed to pass through the nanoscopic apertures at the sidewalls of PDMS reliefs to expose underlying photoresist at nanoscale regions, thus producing subwavelength nan...
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Détails bibliographiques
| Publié dans: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 31(2015), 17 vom: 05. Mai, Seite 5005-13
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| Auteur principal: |
Wu, Jin
(Auteur) |
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| Autres auteurs: |
Liu, Yayuan,
Guo, Yuanyuan,
Feng, Shuanglong,
Zou, Binghua,
Mao, Hui,
Yu, Cheng-han,
Tian, Danbi,
Huang, Wei,
Huo, Fengwei |
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| Format: | Article en ligne
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| Langue: | English |
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| Publié: |
2015
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| Accès à la collection: | Langmuir : the ACS journal of surfaces and colloids
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| Sujets: | Journal Article
Research Support, Non-U.S. Gov't
Dimethylpolysiloxanes
baysilon
63148-62-9
Gold
7440-57-5 |
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