Wu, J., Liu, Y., Guo, Y., Feng, S., Zou, B., Mao, H., . . . Huo, F. (2015). Centimeter-scale subwavelength photolithography using metal-coated elastomeric photomasks with modulated light intensity at the oblique sidewalls. Langmuir : the ACS journal of surfaces and colloids, 31(17), 5005. https://doi.org/10.1021/acs.langmuir.5b00568
Style de citation ChicagoWu, Jin, et al. "Centimeter-scale Subwavelength Photolithography Using Metal-coated Elastomeric Photomasks with Modulated Light Intensity at the Oblique Sidewalls." Langmuir : The ACS Journal of Surfaces and Colloids 31, no. 17 (2015): 5005. https://dx.doi.org/10.1021/acs.langmuir.5b00568.
Style de citation MLAWu, Jin, et al. "Centimeter-scale Subwavelength Photolithography Using Metal-coated Elastomeric Photomasks with Modulated Light Intensity at the Oblique Sidewalls." Langmuir : The ACS Journal of Surfaces and Colloids, vol. 31, no. 17, 2015, p. 5005.