Microcontact-printing-assisted access of graphitic carbon nitride films with favorable textures toward photoelectrochemical application

Microcontact-printing-assisted access of graphitic carbon nitride films with favorable textures toward photoelectrochemical application

© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 27(2015), 4 vom: 27. Jan., Seite 712-8
1. Verfasser: Liu, Jian (VerfasserIn)
Weitere Verfasser: Wang, Hongqiang, Chen, Zu Peng, Moehwald, Helmuth, Fiechter, Sebastian, van de Krol, Roel, Wen, Liping, Jiang, Lei, Antonietti, Markus
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2015
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article anodic aluminum oxide graphitic carbon nitride film microcontact printing pattern photoelectrochemical
LEADER 01000naa a22002652 4500
001 NLM244451796
003 DE-627
005 20231224134728.0
007 cr uuu---uuuuu
008 231224s2015 xx |||||o 00| ||eng c
024 7 |a 10.1002/adma.201404543  |2 doi 
028 5 2 |a pubmed24n0814.xml 
035 |a (DE-627)NLM244451796 
035 |a (NLM)25492578 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
100 1 |a Liu, Jian  |e verfasserin  |4 aut 
245 1 0 |a Microcontact-printing-assisted access of graphitic carbon nitride films with favorable textures toward photoelectrochemical application 
264 1 |c 2015 
336 |a Text  |b txt  |2 rdacontent 
337 |a ƒaComputermedien  |b c  |2 rdamedia 
338 |a ƒa Online-Ressource  |b cr  |2 rdacarrier 
500 |a Date Completed 21.05.2015 
500 |a Date Revised 30.09.2020 
500 |a published: Print-Electronic 
500 |a Citation Status PubMed-not-MEDLINE 
520 |a © 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. 
520 |a An "ink" (cyanamide) infiltrated anodic aluminum oxide (AAO) stamp is found capable of printing carbon nitride films featuring regular microstructures of the stamp onto the substrates via in situ "chemical vapor deposition". A photocurrent density of 30.2 μA cm(-2 --) at 1.23 VRHE is achieved for a film on a conductive substrate, which is so far the highest value for pure carbon nitride based photoelectrochemical devices 
650 4 |a Journal Article 
650 4 |a anodic aluminum oxide 
650 4 |a graphitic carbon nitride film 
650 4 |a microcontact printing 
650 4 |a pattern 
650 4 |a photoelectrochemical 
700 1 |a Wang, Hongqiang  |e verfasserin  |4 aut 
700 1 |a Chen, Zu Peng  |e verfasserin  |4 aut 
700 1 |a Moehwald, Helmuth  |e verfasserin  |4 aut 
700 1 |a Fiechter, Sebastian  |e verfasserin  |4 aut 
700 1 |a van de Krol, Roel  |e verfasserin  |4 aut 
700 1 |a Wen, Liping  |e verfasserin  |4 aut 
700 1 |a Jiang, Lei  |e verfasserin  |4 aut 
700 1 |a Antonietti, Markus  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Advanced materials (Deerfield Beach, Fla.)  |d 1998  |g 27(2015), 4 vom: 27. Jan., Seite 712-8  |w (DE-627)NLM098206397  |x 1521-4095  |7 nnns 
773 1 8 |g volume:27  |g year:2015  |g number:4  |g day:27  |g month:01  |g pages:712-8 
856 4 0 |u http://dx.doi.org/10.1002/adma.201404543  |3 Volltext 
912 |a GBV_USEFLAG_A 
912 |a SYSFLAG_A 
912 |a GBV_NLM 
912 |a GBV_ILN_350 
951 |a AR 
952 |d 27  |j 2015  |e 4  |b 27  |c 01  |h 712-8