Microcontact-printing-assisted access of graphitic carbon nitride films with favorable textures toward photoelectrochemical application

Microcontact-printing-assisted access of graphitic carbon nitride films with favorable textures toward photoelectrochemical application

© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 27(2015), 4 vom: 27. Jan., Seite 712-8
1. Verfasser: Liu, Jian (VerfasserIn)
Weitere Verfasser: Wang, Hongqiang, Chen, Zu Peng, Moehwald, Helmuth, Fiechter, Sebastian, van de Krol, Roel, Wen, Liping, Jiang, Lei, Antonietti, Markus
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2015
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article anodic aluminum oxide graphitic carbon nitride film microcontact printing pattern photoelectrochemical
Beschreibung
Zusammenfassung:© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
An "ink" (cyanamide) infiltrated anodic aluminum oxide (AAO) stamp is found capable of printing carbon nitride films featuring regular microstructures of the stamp onto the substrates via in situ "chemical vapor deposition". A photocurrent density of 30.2 μA cm(-2 --) at 1.23 VRHE is achieved for a film on a conductive substrate, which is so far the highest value for pure carbon nitride based photoelectrochemical devices
Beschreibung:Date Completed 21.05.2015
Date Revised 30.09.2020
published: Print-Electronic
Citation Status PubMed-not-MEDLINE
ISSN:1521-4095
DOI:10.1002/adma.201404543