An epitaxial ferroelectric tunnel junction on silicon

© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 26(2014), 42 vom: 12. Nov., Seite 7185-9
1. Verfasser: Li, Zhipeng (VerfasserIn)
Weitere Verfasser: Guo, Xiao, Lu, Hui-Bin, Zhang, Zaoli, Song, Dongsheng, Cheng, Shaobo, Bosman, Michel, Zhu, Jing, Dong, Zhili, Zhu, Weiguang
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2014
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article Research Support, Non-U.S. Gov't epitaxial growth ferroelectric tunnel junction non-volatile memory pulsed laser deposition tunneling electroresistance Barium Compounds Calcium Compounds Oxides mehr... barium titanate(IV) 12047-27-7 perovskite 12194-71-7 Titanium D1JT611TNE Silicon Z4152N8IUI
Beschreibung
Zusammenfassung:© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Epitaxially grown functional perovskites on silicon (001) and the ferroelectricity of a 3.2 nm thick BaTiO3 barrier layer are demonstrated. The polarization-switching-induced change in tunneling resistance is measured to be two orders of magnitude. The obtained results suggest the possibility of integrating ferroelectric tunnel junctions as binary data storage media in non-volatile memory cells on a silicon platform
Beschreibung:Date Completed 17.07.2015
Date Revised 30.09.2020
published: Print-Electronic
Citation Status MEDLINE
ISSN:1521-4095
DOI:10.1002/adma.201402527