Flexoelectric control of defect formation in ferroelectric epitaxial thin films

© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 26(2014), 29 vom: 06. Aug., Seite 5005-11
1. Verfasser: Lee, Daesu (VerfasserIn)
Weitere Verfasser: Jeon, Byung Chul, Yoon, Aram, Shin, Yeong Jae, Lee, Myang Hwan, Song, Tae Kwon, Bu, Sang Don, Kim, Miyoung, Chung, Jin-Seok, Yoon, Jong-Gul, Noh, Tae Won
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2014
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article Research Support, Non-U.S. Gov't defect engineering epitaxial thin film ferroelectric flexoelectric strain gradient Ferric Compounds ferrite 1317-54-0
LEADER 01000naa a22002652 4500
001 NLM238437701
003 DE-627
005 20231224113805.0
007 cr uuu---uuuuu
008 231224s2014 xx |||||o 00| ||eng c
024 7 |a 10.1002/adma.201400654  |2 doi 
028 5 2 |a pubmed24n0794.xml 
035 |a (DE-627)NLM238437701 
035 |a (NLM)24847984 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
100 1 |a Lee, Daesu  |e verfasserin  |4 aut 
245 1 0 |a Flexoelectric control of defect formation in ferroelectric epitaxial thin films 
264 1 |c 2014 
336 |a Text  |b txt  |2 rdacontent 
337 |a ƒaComputermedien  |b c  |2 rdamedia 
338 |a ƒa Online-Ressource  |b cr  |2 rdacarrier 
500 |a Date Completed 31.08.2015 
500 |a Date Revised 30.09.2020 
500 |a published: Print-Electronic 
500 |a Citation Status MEDLINE 
520 |a © 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. 
520 |a Flexoelectric control of defect formation and associated electronic function is demonstrated in ferroelectric BiFeO3 thin films. An intriguing, so far never demonstrated, effect of internal electric field (Eint ) on defect formation is explored by a means of flexoelectricity. Our study provides novel insight into defect engineering, as well as allows a pathway to design defect configuration and associated electronic function 
650 4 |a Journal Article 
650 4 |a Research Support, Non-U.S. Gov't 
650 4 |a defect engineering 
650 4 |a epitaxial thin film 
650 4 |a ferroelectric 
650 4 |a flexoelectric 
650 4 |a strain gradient 
650 7 |a Ferric Compounds  |2 NLM 
650 7 |a ferrite  |2 NLM 
650 7 |a 1317-54-0  |2 NLM 
700 1 |a Jeon, Byung Chul  |e verfasserin  |4 aut 
700 1 |a Yoon, Aram  |e verfasserin  |4 aut 
700 1 |a Shin, Yeong Jae  |e verfasserin  |4 aut 
700 1 |a Lee, Myang Hwan  |e verfasserin  |4 aut 
700 1 |a Song, Tae Kwon  |e verfasserin  |4 aut 
700 1 |a Bu, Sang Don  |e verfasserin  |4 aut 
700 1 |a Kim, Miyoung  |e verfasserin  |4 aut 
700 1 |a Chung, Jin-Seok  |e verfasserin  |4 aut 
700 1 |a Yoon, Jong-Gul  |e verfasserin  |4 aut 
700 1 |a Noh, Tae Won  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Advanced materials (Deerfield Beach, Fla.)  |d 1998  |g 26(2014), 29 vom: 06. Aug., Seite 5005-11  |w (DE-627)NLM098206397  |x 1521-4095  |7 nnns 
773 1 8 |g volume:26  |g year:2014  |g number:29  |g day:06  |g month:08  |g pages:5005-11 
856 4 0 |u http://dx.doi.org/10.1002/adma.201400654  |3 Volltext 
912 |a GBV_USEFLAG_A 
912 |a SYSFLAG_A 
912 |a GBV_NLM 
912 |a GBV_ILN_350 
951 |a AR 
952 |d 26  |j 2014  |e 29  |b 06  |c 08  |h 5005-11