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231224s2014 xx |||||o 00| ||eng c |
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|a 10.1002/adma.201401290
|2 doi
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|a pubmed24n0794.xml
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|a (NLM)24831417
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|a DE-627
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|c DE-627
|e rakwb
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|a eng
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1 |
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|a García-Fernández, Luis
|e verfasserin
|4 aut
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|a Dual photosensitive polymers with wavelength-selective photoresponse
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|c 2014
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
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|2 rdacarrier
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|a Date Completed 31.08.2015
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|a Date Revised 30.09.2020
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|a published: Print-Electronic
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|a Citation Status MEDLINE
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|a © 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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|a Polyurethane thin films that photopolymerize and photodegrade upon exposure to light of different wavelengths are presented. The chromic response is based on two caged monomers with the ability to be activated or photocleaved with different wavelengths under single and two-photon excitation. This material represents a dual photoresist with "positive" and "negative" tone contained in a single resist formulation and with the ability to generate complex 2D and 3D patterns
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|a Journal Article
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|a Research Support, Non-U.S. Gov't
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|a caged compounds
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|a photoremovable groups
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|a photoresist
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|a photosensitive polymers
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|a wavelength selectivity
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|a Nitro Compounds
|2 NLM
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|a Polymers
|2 NLM
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1 |
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|a Herbivo, Cyril
|e verfasserin
|4 aut
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1 |
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|a Arranz, Verónica San Miguel
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Warther, David
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Donato, Loïc
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Specht, Alexandre
|e verfasserin
|4 aut
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| 700 |
1 |
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|a del Campo, Aránzazu
|e verfasserin
|4 aut
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| 773 |
0 |
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 26(2014), 29 vom: 06. Aug., Seite 5012-7
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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| 773 |
1 |
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|g volume:26
|g year:2014
|g number:29
|g day:06
|g month:08
|g pages:5012-7
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|u http://dx.doi.org/10.1002/adma.201401290
|3 Volltext
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