Dual photosensitive polymers with wavelength-selective photoresponse
© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
| Publié dans: | Advanced materials (Deerfield Beach, Fla.). - 1998. - 26(2014), 29 vom: 06. Aug., Seite 5012-7 |
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| Auteur principal: | |
| Autres auteurs: | , , , , , |
| Format: | Article en ligne |
| Langue: | English |
| Publié: |
2014
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| Accès à la collection: | Advanced materials (Deerfield Beach, Fla.) |
| Sujets: | Journal Article Research Support, Non-U.S. Gov't caged compounds photoremovable groups photoresist photosensitive polymers wavelength selectivity Nitro Compounds Polymers |
| Résumé: | © 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. Polyurethane thin films that photopolymerize and photodegrade upon exposure to light of different wavelengths are presented. The chromic response is based on two caged monomers with the ability to be activated or photocleaved with different wavelengths under single and two-photon excitation. This material represents a dual photoresist with "positive" and "negative" tone contained in a single resist formulation and with the ability to generate complex 2D and 3D patterns |
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| Description: | Date Completed 31.08.2015 Date Revised 30.09.2020 published: Print-Electronic Citation Status MEDLINE |
| ISSN: | 1521-4095 |
| DOI: | 10.1002/adma.201401290 |