Impact of plasma pretreatment and pore size on the sealing of ultra-low-k dielectrics by self-assembled monolayers
Self-assembled monolayers (SAMs) from an 11-cyanoundecyltrichlorosilane (CN-SAM) precursor were deposited on porous SiCOH low-k dielectrics with three different pore radii, namely, 1.7, 0.7, and lower than 0.5 nm. The low-k dielectrics were first pretreated with either O2 or He/H2 plasma in order to...
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Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 30(2014), 13 vom: 08. Apr., Seite 3832-44
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| 1. Verfasser: |
Sun, Yiting
(VerfasserIn) |
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| Weitere Verfasser: |
Krishtab, Mikhail,
Struyf, Herbert,
Verdonck, Patrick,
De Feyter, Steven,
Baklanov, Mikhail R,
Armini, Silvia |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2014
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article |
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