Impact of plasma pretreatment and pore size on the sealing of ultra-low-k dielectrics by self-assembled monolayers

Self-assembled monolayers (SAMs) from an 11-cyanoundecyltrichlorosilane (CN-SAM) precursor were deposited on porous SiCOH low-k dielectrics with three different pore radii, namely, 1.7, 0.7, and lower than 0.5 nm. The low-k dielectrics were first pretreated with either O2 or He/H2 plasma in order to...

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Publié dans:	Langmuir : the ACS journal of surfaces and colloids. - 1985. - 30(2014), 13 vom: 08. Apr., Seite 3832-44
Auteur principal:	Sun, Yiting (Auteur)
Autres auteurs:	Krishtab, Mikhail, Struyf, Herbert, Verdonck, Patrick, De Feyter, Steven, Baklanov, Mikhail R, Armini, Silvia
Format:	Article en ligne
Langue:	English
Publié:	2014
Accès à la collection:	Langmuir : the ACS journal of surfaces and colloids
Sujets:	Journal Article