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231224s2014 xx |||||o 00| ||eng c |
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|a 10.1002/adma.201303452
|2 doi
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|a pubmed24n0772.xml
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|a eng
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|a Kim, So Youn
|e verfasserin
|4 aut
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|a Metal-containing block copolymer thin films yield wire grid polarizers with high aspect ratio
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|c 2014
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
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|2 rdamedia
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|a ƒa Online-Ressource
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|a Date Completed 29.09.2014
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|a Date Revised 01.10.2020
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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|a Highly selective etch masks are formed by thin films of a polystyrene-b-poly(ferrocenylisopropylmethylsilane) diblock copolymer, PS-PFiPMS, containing hemicylindrical domains of PFiPMS. These domains, with a period of 35 nm, are readily aligned through mechanical shear. Aligned PS-PFiPMS templates are employed to fabricate high-aspect-ratio nanowire grids from amorphous silicon, which can polarize deep ultraviolet radiation, including 193 nm, at >90% efficiency
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|a Journal Article
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|a Research Support, U.S. Gov't, Non-P.H.S.
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|a block copolymer lithography
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|a nanopatterning
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|a wire grid polarizer
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|a Gwyther, Jessica
|e verfasserin
|4 aut
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1 |
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|a Manners, Ian
|e verfasserin
|4 aut
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1 |
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|a Chaikin, Paul M
|e verfasserin
|4 aut
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|a Register, Richard A
|e verfasserin
|4 aut
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 26(2014), 5 vom: 18. Feb., Seite 791-5
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|x 1521-4095
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|g volume:26
|g year:2014
|g number:5
|g day:18
|g month:02
|g pages:791-5
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|u http://dx.doi.org/10.1002/adma.201303452
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