Establishment of a derivatization method to quantify thiol function in sulfur-containing plasma polymer films

Thiol-supported surfaces draw more and more interest in numerous fields of applications from biotechnology to catalysis. Among the various strategies to generate such surfaces, the plasma polymerization of a thiol-containing molecule appears to be one of the ideal candidates. Nevertheless, consideri...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 29(2013), 43 vom: 29. Okt., Seite 13183-9
1. Verfasser: Thiry, Damien (VerfasserIn)
Weitere Verfasser: Francq, Remy, Cossement, Damien, Guerin, David, Vuillaume, Dominique, Snyders, Rony
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2013
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article Research Support, Non-U.S. Gov't Polymers Sulfhydryl Compounds Sulfur 70FD1KFU70 Ethylmaleimide O3C74ACM9V
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520 |a Thiol-supported surfaces draw more and more interest in numerous fields of applications from biotechnology to catalysis. Among the various strategies to generate such surfaces, the plasma polymerization of a thiol-containing molecule appears to be one of the ideal candidates. Nevertheless, considering such an approach, a careful characterization of the material surface chemistry is necessary. In this work, an original chemical derivatization method aiming to quantitatively probe the -SH functions in plasma polymers was established using N-ethylmaleimide as a labeling molecule. The method was qualitatively and quantitatively validated on self-assembled monolayers of 3-mercaptopropyltrimethoxysilane exhibiting a -SH-terminated group used as "model" surface. For a quantitative determination of the -SH content in propanethiol plasma polymers, the kinetics of the reaction was investigated. The latter is described as a two-step mechanism, namely a fast surface reaction followed by a diffusion-limited one. The density of -SH groups deduced from the derivatization method (~4%) is in good agreement with typical values measured in some other plasma polymer families. The whole set of our data opens up new possibilities for optimizing the -SH content in thiol-based plasma polymer films 
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650 4 |a Research Support, Non-U.S. Gov't 
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650 7 |a Sulfhydryl Compounds  |2 NLM 
650 7 |a Sulfur  |2 NLM 
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650 7 |a Ethylmaleimide  |2 NLM 
650 7 |a O3C74ACM9V  |2 NLM 
700 1 |a Francq, Remy  |e verfasserin  |4 aut 
700 1 |a Cossement, Damien  |e verfasserin  |4 aut 
700 1 |a Guerin, David  |e verfasserin  |4 aut 
700 1 |a Vuillaume, Dominique  |e verfasserin  |4 aut 
700 1 |a Snyders, Rony  |e verfasserin  |4 aut 
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