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|a eng
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|a Zhylik, A
|e verfasserin
|4 aut
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|a Covariant description of X-ray diffraction from anisotropically relaxed epitaxial structures
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|c 2013
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|a Text
|b txt
|2 rdacontent
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|a ohne Hilfsmittel zu benutzen
|b n
|2 rdamedia
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|a Band
|b nc
|2 rdacarrier
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|a Date Revised 21.10.2021
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a A general theoretical approach to the description of epitaxial layers with essentially different cell parameters and in-plane relaxation anisotropy has been developed. A covariant description of relaxation in such structures has been introduced. An iteration method for evaluation of these parameters on the basis of the diffraction data set has been worked out together with error analysis and reliability checking. The validity of the presented theoretical approaches has been proved with a-ZnO on r-sapphire samples grown in the temperature range from 573 K up to 1073 K. A covariant description of relaxation anisotropy for these samples has been estimated with data measured for different directions of the diffraction plane relative to the sample surface
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|a Journal Article
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|a epitaxial layers
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|a high-resolution X-ray diffraction
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|a relaxation parameters
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|a theoretical approach
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|a Benediktovitch, A
|e verfasserin
|4 aut
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|a Feranchuk, I
|e verfasserin
|4 aut
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| 700 |
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|a Inaba, K
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Mikhalychev, A
|e verfasserin
|4 aut
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|a Ulyanenkov, A
|e verfasserin
|4 aut
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|i Enthalten in
|t Journal of applied crystallography
|d 1998
|g 46(2013), Pt 4 vom: 01. Aug., Seite 919-925
|w (DE-627)NLM098121561
|x 0021-8898
|7 nnns
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| 773 |
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|g volume:46
|g year:2013
|g number:Pt 4
|g day:01
|g month:08
|g pages:919-925
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|d 46
|j 2013
|e Pt 4
|b 01
|c 08
|h 919-925
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