Correlation between propagation loss and silicon dioxide film properties for surface acoustic wave devices
The correlation between the propagation loss and SiO2 film properties has been studied for temperature-compensated SAW devices using the SiO2/LiNbO3 structure. The SAW devices were prepared under different deposition temperatures for SiO2 film. Although they possessed excellent temperature coefficie...
Ausführliche Beschreibung
Bibliographische Detailangaben
Veröffentlicht in: | IEEE transactions on ultrasonics, ferroelectrics, and frequency control. - 1986. - 60(2013), 5 vom: 21. Mai, Seite 993-7
|
1. Verfasser: |
Matsuda, Satoru
(VerfasserIn) |
Weitere Verfasser: |
Miura, Michio,
Matsuda, Takashi,
Ueda, Masanori,
Satoh, Yoshio,
Hashimoto, Ken-Ya |
Format: | Online-Aufsatz
|
Sprache: | English |
Veröffentlicht: |
2013
|
Zugriff auf das übergeordnete Werk: | IEEE transactions on ultrasonics, ferroelectrics, and frequency control
|
Schlagworte: | Journal Article |