Dual patterning of a poly(acrylic acid) layer by electron-beam and block copolymer lithographies

We show the controllable patterning of palladium nanoparticles in both one and two dimensions using electron-beam lithography and reactive ion etching of a thin film of poly(acrylic acid) (PAA). After the initial patterning of the PAA, a monolayer of polystyrene-b-poly-2-vinylpyridine micelles is sp...

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Publié dans:	Langmuir : the ACS journal of surfaces and colloids. - 1985. - 29(2013), 24 vom: 18. Juni, Seite 7433-8
Auteur principal:	Pearson, Anthony C (Auteur)
Autres auteurs:	Linford, Matthew R, Harb, John N, Davis, Robert C
Format:	Article en ligne
Langue:	English
Publié:	2013
Accès à la collection:	Langmuir : the ACS journal of surfaces and colloids
Sujets:	Journal Article