Pearson, A. C., Linford, M. R., Harb, J. N., & Davis, R. C. (2013). Dual patterning of a poly(acrylic acid) layer by electron-beam and block copolymer lithographies. Langmuir : the ACS journal of surfaces and colloids, 29(24), 7433. https://doi.org/10.1021/la304486x
Style de citation ChicagoPearson, Anthony C., Matthew R. Linford, John N. Harb, et Robert C. Davis. "Dual Patterning of a Poly(acrylic Acid) Layer by Electron-beam and Block Copolymer Lithographies." Langmuir : The ACS Journal of Surfaces and Colloids 29, no. 24 (2013): 7433. https://dx.doi.org/10.1021/la304486x.
Style de citation MLAPearson, Anthony C., et al. "Dual Patterning of a Poly(acrylic Acid) Layer by Electron-beam and Block Copolymer Lithographies." Langmuir : The ACS Journal of Surfaces and Colloids, vol. 29, no. 24, 2013, p. 7433.