High-performance transistors based on zinc tin oxides by single spin-coating process

Films of zinc tin oxide (ZTO), grown from solutions with zinc acetate dehydrate and tin(II) 2-ethylhexanoate dissolved in 2-methoxyethanol, have been used to fabricate thin-film transistors in combination with solution-processed aluminum oxide as the gate insulator. And the nonhomogeneity of the sin...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 29(2013), 1 vom: 08. Jan., Seite 151-7
1. Verfasser: Zhao, Yunlong (VerfasserIn)
Weitere Verfasser: Duan, Lian, Dong, Guifang, Zhang, Deqiang, Qiao, Juan, Wang, Liduo, Qiu, Yong
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2013
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article
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520 |a Films of zinc tin oxide (ZTO), grown from solutions with zinc acetate dehydrate and tin(II) 2-ethylhexanoate dissolved in 2-methoxyethanol, have been used to fabricate thin-film transistors in combination with solution-processed aluminum oxide as the gate insulator. And the nonhomogeneity of the single-layer ZTO films, caused by both ZTO film-substrate interaction and surface crystallization, has been studied, which is essential to achieve high performance transistors. In the bottom-contact thin-film transistor based on a Sn-rich layer of ZTO, a high mobility of 78.9 cm(2) V(-1) s(-1) in the saturation region has been obtained, with an on-to-off current ratio of 10(5) and a threshold gate voltage of 1.6 V 
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700 1 |a Duan, Lian  |e verfasserin  |4 aut 
700 1 |a Dong, Guifang  |e verfasserin  |4 aut 
700 1 |a Zhang, Deqiang  |e verfasserin  |4 aut 
700 1 |a Qiao, Juan  |e verfasserin  |4 aut 
700 1 |a Wang, Liduo  |e verfasserin  |4 aut 
700 1 |a Qiu, Yong  |e verfasserin  |4 aut 
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