UV photoactivated room temperature CVD of aluminum on functionalized self-assembled monolayers adsorbed on Au
We have investigated the selective photoactivated room temperature chemical vapor deposition (CVD) of aluminum (Al) on functionalized self-assembled monolayers adsorbed on Au. The CVD precursor employed is trimethyl aluminum (TMA). Using a deuterium arc lamp we demonstrate that the rate of the Al fi...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 28(2012), 49 vom: 11. Dez., Seite 16909-16 |
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| Format: | Online-Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2012
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article |
| Zusammenfassung: | We have investigated the selective photoactivated room temperature chemical vapor deposition (CVD) of aluminum (Al) on functionalized self-assembled monolayers adsorbed on Au. The CVD precursor employed is trimethyl aluminum (TMA). Using a deuterium arc lamp we demonstrate that the rate of the Al film growth is approximately twice that observed for nonphotoactivated Al chemical vapor deposition (CVD) using TMA. At the wavelengths employed, the photolysis of TMA leads to the dissociation of the TMA dimer to its monomer followed by successive release of methyl groups to form (CH(3))(3-x)Al. The photogenerated (CH(3))(3-x)Al species react with -OH- and -COOH-terminated SAMs but not -CH(3)-terminated SAMs. Using these reactions we demonstrate that aluminum can be selectively deposited on -CH(3)/-COOH-patterned SAMs. The possible reaction mechanisms involved in the Al film growth are discussed. These results indicate that photoactivated CVD (laser CVD) processes are suitable for the deposition of stable films of metals and other materials on organic films |
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| Beschreibung: | Date Completed 20.05.2013 Date Revised 11.12.2012 published: Print-Electronic Citation Status PubMed-not-MEDLINE |
| ISSN: | 1520-5827 |
| DOI: | 10.1021/la303454d |