UV photoactivated room temperature CVD of aluminum on functionalized self-assembled monolayers adsorbed on Au
We have investigated the selective photoactivated room temperature chemical vapor deposition (CVD) of aluminum (Al) on functionalized self-assembled monolayers adsorbed on Au. The CVD precursor employed is trimethyl aluminum (TMA). Using a deuterium arc lamp we demonstrate that the rate of the Al fi...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 28(2012), 49 vom: 11. Dez., Seite 16909-16 |
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| Format: | Online-Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2012
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article |
| Online verfügbar |
Volltext |