Tailored star block copolymer architecture for high performance chemically amplified resists

Bibliographische Detailangaben
Veröffentlicht in:	Advanced materials (Deerfield Beach, Fla.). - 1998. - 24(2012), 44 vom: 20. Nov., Seite 5939-44
1. Verfasser:	Wieberger, Florian (VerfasserIn)
Weitere Verfasser:	Neuber, Christian, Ober, Christopher K, Schmidt, Hans-Werner
Format:	Online-Aufsatz
Sprache:	English
Veröffentlicht:	2012
Zugriff auf das übergeordnete Werk:	Advanced materials (Deerfield Beach, Fla.)
Schlagworte:	Journal Article Research Support, Non-U.S. Gov't Polymers


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245	1	0	\|a Tailored star block copolymer architecture for high performance chemically amplified resists
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500			\|a Date Completed 01.05.2013
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500			\|a Citation Status MEDLINE
520			\|a Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
520			\|a Star block copolymers are demonstrated for their application as a high-performance resist material. This new resist material shows advanced progress in sensitivity and solubility contrast and is finally combinatorially optimized to achieve a 66 nm line/space pattern. The tailored molecular architecture of the star block copolymer is synthesized via core-first atom transfer radical polymerization (ATRP) and shows narrow polydispersity indices below 1.2
650		4	\|a Journal Article
650		4	\|a Research Support, Non-U.S. Gov't
650		7	\|a Polymers \|2 NLM
700	1		\|a Neuber, Christian \|e verfasserin \|4 aut
700	1		\|a Ober, Christopher K \|e verfasserin \|4 aut
700	1		\|a Schmidt, Hans-Werner \|e verfasserin \|4 aut
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856	4	0	\|u http://dx.doi.org/10.1002/adma.201201547 \|3 Volltext
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