Preparation of high-quality colloidal mask for nanosphere lithography by a combination of air/water interface self-assembly and solvent vapor annealing
Nanosphere lithography (NSL) has been regarded as an inexpensive, inherently parallel, high-throughput, materials-general approach to the fabrication of nanoparticle arrays. However, the order of the resulting nanoparticle array is essentially dependent on the quality of the colloidal monolayer mask...
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Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 28(2012), 34 vom: 28. Aug., Seite 12681-9
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| 1. Verfasser: |
Yu, Jie
(VerfasserIn) |
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| Weitere Verfasser: |
Geng, Chong,
Zheng, Lu,
Ma, Zhaohui,
Tan, Tianya,
Wang, Xiaoqing,
Yan, Qingfeng,
Shen, Dezhong |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2012
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article |
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