Surface chemistry, reactivity, and pore structure of porous silicon oxidized by various methods
Oxidation is the most commonly used method of passivating porous silicon (PSi) surfaces against unwanted reactions with guest molecules and temporal changes during storage or use. In the present study, several oxidation methods were compared in order to find optimal methods able to generate inert su...
Ausführliche Beschreibung
Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 28(2012), 28 vom: 17. Juli, Seite 10573-83
|
|---|
| 1. Verfasser: |
Riikonen, Joakim
(VerfasserIn) |
|---|
| Weitere Verfasser: |
Salomäki, Mikko,
van Wonderen, Jessica,
Kemell, Marianna,
Xu, Wujun,
Korhonen, Ossi,
Ritala, Mikko,
MacMillan, Fraser,
Salonen, Jarno,
Lehto, Vesa-Pekka |
|---|
| Format: | Online-Aufsatz
|
|---|
| Sprache: | English |
|---|
| Veröffentlicht: |
2012
|
|---|
| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
|
|---|
| Schlagworte: | Journal Article
Research Support, Non-U.S. Gov't
Silicon
Z4152N8IUI |
|---|