Design rule of nanostructures in light-emitting diodes for complete elimination of total internal reflection

Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 24(2012), 17 vom: 02. Mai, Seite 2259-62
1. Verfasser: Son, Jun Ho (VerfasserIn)
Weitere Verfasser: Kim, Jong Uk, Song, Yang Hee, Kim, Buem Joon, Ryu, Chul Jong, Lee, Jong-Lam
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2012
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article Research Support, Non-U.S. Gov't Silicon Dioxide 7631-86-9
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520 |a Cone-shaped nanostructures with controllable side-wall angle are success- fully fabricated with a SiO(2) nanosphere lithography (NSL) etching mask. Vertical LEDs with cone-shaped nanostructures with a 24.1° side-wall angle provide 6% more light output power compared to those using hexagonal pyramids formed by photochemical etching. This achievement is attributed to effective elimination of total internal reflection by angle-controlled nanostructures 
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700 1 |a Kim, Jong Uk  |e verfasserin  |4 aut 
700 1 |a Song, Yang Hee  |e verfasserin  |4 aut 
700 1 |a Kim, Buem Joon  |e verfasserin  |4 aut 
700 1 |a Ryu, Chul Jong  |e verfasserin  |4 aut 
700 1 |a Lee, Jong-Lam  |e verfasserin  |4 aut 
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