Large magnetoresistance in few layer graphene stacks with current perpendicular to plane geometry

Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 24(2012), 14 vom: 10. Apr., Seite 1862-6
1. Verfasser: Liao, Zhi-Min (VerfasserIn)
Weitere Verfasser: Wu, Han-Chun, Kumar, Shishir, Duesberg, Georg S, Zhou, Yang-Bo, Cross, Graham L W, Shvets, Igor V, Yu, Da-Peng
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2012
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article Research Support, Non-U.S. Gov't Silicon Dioxide 7631-86-9 Graphite 7782-42-5
LEADER 01000naa a22002652 4500
001 NLM216102197
003 DE-627
005 20231224031002.0
007 cr uuu---uuuuu
008 231224s2012 xx |||||o 00| ||eng c
024 7 |a 10.1002/adma.201104796  |2 doi 
028 5 2 |a pubmed24n0720.xml 
035 |a (DE-627)NLM216102197 
035 |a (NLM)22407473 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
100 1 |a Liao, Zhi-Min  |e verfasserin  |4 aut 
245 1 0 |a Large magnetoresistance in few layer graphene stacks with current perpendicular to plane geometry 
264 1 |c 2012 
336 |a Text  |b txt  |2 rdacontent 
337 |a ƒaComputermedien  |b c  |2 rdamedia 
338 |a ƒa Online-Ressource  |b cr  |2 rdacarrier 
500 |a Date Completed 16.07.2012 
500 |a Date Revised 30.09.2020 
500 |a published: Print-Electronic 
500 |a Citation Status MEDLINE 
520 |a Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. 
520 |a A large magnetoresistance (MR) effect of few-layers graphene between two non-magnetic metal electrodes with current perpendicular to graphene plane is studied. A non-saturation and anisotropic MR with the value over 60% at 14 T is observed in a two-layer graphene stack at room temperature. The resistance of the device is only tens of ohms, having the advantage of low power consumption for magnetic device applications 
650 4 |a Journal Article 
650 4 |a Research Support, Non-U.S. Gov't 
650 7 |a Silicon Dioxide  |2 NLM 
650 7 |a 7631-86-9  |2 NLM 
650 7 |a Graphite  |2 NLM 
650 7 |a 7782-42-5  |2 NLM 
700 1 |a Wu, Han-Chun  |e verfasserin  |4 aut 
700 1 |a Kumar, Shishir  |e verfasserin  |4 aut 
700 1 |a Duesberg, Georg S  |e verfasserin  |4 aut 
700 1 |a Zhou, Yang-Bo  |e verfasserin  |4 aut 
700 1 |a Cross, Graham L W  |e verfasserin  |4 aut 
700 1 |a Shvets, Igor V  |e verfasserin  |4 aut 
700 1 |a Yu, Da-Peng  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Advanced materials (Deerfield Beach, Fla.)  |d 1998  |g 24(2012), 14 vom: 10. Apr., Seite 1862-6  |w (DE-627)NLM098206397  |x 1521-4095  |7 nnns 
773 1 8 |g volume:24  |g year:2012  |g number:14  |g day:10  |g month:04  |g pages:1862-6 
856 4 0 |u http://dx.doi.org/10.1002/adma.201104796  |3 Volltext 
912 |a GBV_USEFLAG_A 
912 |a SYSFLAG_A 
912 |a GBV_NLM 
912 |a GBV_ILN_350 
951 |a AR 
952 |d 24  |j 2012  |e 14  |b 10  |c 04  |h 1862-6