Modular deposition chamber for in situ X-ray experiments during RF and DC magnetron sputtering

Modular deposition chamber for in situ X-ray experiments during RF and DC magnetron sputtering

A new sputtering system for in situ X-ray experiments during DC and RF magnetron sputtering is described. The outstanding features of the system are the modular design of the vacuum chamber, the adjustable deposition angle, the option for plasma diagnostics, and the UHV sample transfer in order to a...

Ausführliche Beschreibung

Bibliographische Detailangaben
Veröffentlicht in:Journal of synchrotron radiation. - 1994. - 19(2012), Pt 2 vom: 07. März, Seite 216-22
1. Verfasser: Krause, Bärbel (VerfasserIn)
Weitere Verfasser: Darma, Susan, Kaufholz, Marthe, Gräfe, Hans Hellmuth, Ulrich, Sven, Mantilla, Miguel, Weigel, Ralf, Rembold, Steffen, Baumbach, Tilo
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2012
Zugriff auf das übergeordnete Werk:Journal of synchrotron radiation
Schlagworte:Journal Article Research Support, Non-U.S. Gov't
Beschreibung
Zusammenfassung:A new sputtering system for in situ X-ray experiments during DC and RF magnetron sputtering is described. The outstanding features of the system are the modular design of the vacuum chamber, the adjustable deposition angle, the option for plasma diagnostics, and the UHV sample transfer in order to access complementary surface analysis methods. First in situ diffraction and reflectivity measurements during RF and DC deposition of vanadium carbide demonstrate the performance of the set-up
Beschreibung:Date Completed 14.06.2012
Date Revised 17.02.2012
published: Print-Electronic
Citation Status PubMed-not-MEDLINE
ISSN:1600-5775
DOI:10.1107/S0909049511052320