Chiral nematic fluids as masks for lithography

Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 24(2012), 3 vom: 17. Jan., Seite 381-4
1. Verfasser: Jeong, Hyeon Su (VerfasserIn)
Weitere Verfasser: Kim, Yun Ho, Lee, Ji Sun, Kim, Jung Hyun, Srinivasarao, Mohan, Jung, Hee-Tae
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2012
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article Research Support, Non-U.S. Gov't cholesteric liquid crystals lithography photomasks self-assembly
LEADER 01000caa a22002652 4500
001 NLM213781719
003 DE-627
005 20250213114035.0
007 cr uuu---uuuuu
008 231224s2012 xx |||||o 00| ||eng c
024 7 |a 10.1002/adma.201103817  |2 doi 
028 5 2 |a pubmed25n0712.xml 
035 |a (DE-627)NLM213781719 
035 |a (NLM)22162030 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
100 1 |a Jeong, Hyeon Su  |e verfasserin  |4 aut 
245 1 0 |a Chiral nematic fluids as masks for lithography 
264 1 |c 2012 
336 |a Text  |b txt  |2 rdacontent 
337 |a ƒaComputermedien  |b c  |2 rdamedia 
338 |a ƒa Online-Ressource  |b cr  |2 rdacarrier 
500 |a Date Completed 18.08.2015 
500 |a Date Revised 30.09.2020 
500 |a published: Print-Electronic 
500 |a Citation Status MEDLINE 
520 |a Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. 
520 |a A lithographic scheme is reported that uses a cholesteric liquid crystal with its helical axis in the plane of the sample as a "mask" for imprinting patterns in a photoresist over a large area. On the application of an electric field the cholesteric liquid crystals produce a texture that acts as a lattice of cylindrical lenses for one polarization of a light beam. This is used in photolithography to create parallel lines over large areas 
650 4 |a Journal Article 
650 4 |a Research Support, Non-U.S. Gov't 
650 4 |a cholesteric liquid crystals 
650 4 |a lithography 
650 4 |a photomasks 
650 4 |a self-assembly 
700 1 |a Kim, Yun Ho  |e verfasserin  |4 aut 
700 1 |a Lee, Ji Sun  |e verfasserin  |4 aut 
700 1 |a Kim, Jung Hyun  |e verfasserin  |4 aut 
700 1 |a Srinivasarao, Mohan  |e verfasserin  |4 aut 
700 1 |a Jung, Hee-Tae  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Advanced materials (Deerfield Beach, Fla.)  |d 1998  |g 24(2012), 3 vom: 17. Jan., Seite 381-4  |w (DE-627)NLM098206397  |x 1521-4095  |7 nnns 
773 1 8 |g volume:24  |g year:2012  |g number:3  |g day:17  |g month:01  |g pages:381-4 
856 4 0 |u http://dx.doi.org/10.1002/adma.201103817  |3 Volltext 
912 |a GBV_USEFLAG_A 
912 |a SYSFLAG_A 
912 |a GBV_NLM 
912 |a GBV_ILN_350 
951 |a AR 
952 |d 24  |j 2012  |e 3  |b 17  |c 01  |h 381-4