Chiral nematic fluids as masks for lithography

Chiral nematic fluids as masks for lithography

Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 24(2012), 3 vom: 17. Jan., Seite 381-4
1. Verfasser: Jeong, Hyeon Su (VerfasserIn)
Weitere Verfasser: Kim, Yun Ho, Lee, Ji Sun, Kim, Jung Hyun, Srinivasarao, Mohan, Jung, Hee-Tae
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2012
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article Research Support, Non-U.S. Gov't cholesteric liquid crystals lithography photomasks self-assembly
Beschreibung
Zusammenfassung:Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
A lithographic scheme is reported that uses a cholesteric liquid crystal with its helical axis in the plane of the sample as a "mask" for imprinting patterns in a photoresist over a large area. On the application of an electric field the cholesteric liquid crystals produce a texture that acts as a lattice of cylindrical lenses for one polarization of a light beam. This is used in photolithography to create parallel lines over large areas
Beschreibung:Date Completed 18.08.2015
Date Revised 30.09.2020
published: Print-Electronic
Citation Status MEDLINE
ISSN:1521-4095
DOI:10.1002/adma.201103817