High-performance, all-solution-processed organic nanowire transistor arrays with inkjet-printing patterned electrodes

© 2011 American Chemical Society

Bibliographische Detailangaben
Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 27(2011), 24 vom: 20. Dez., Seite 14710-5
1. Verfasser: Liu, Nanliu (VerfasserIn)
Weitere Verfasser: Zhou, Yan, Ai, Na, Luo, Chan, Peng, Junbiao, Wang, Jian, Pei, Jian, Cao, Yong
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2011
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article Research Support, Non-U.S. Gov't
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520 |a Organic nanowire (NW) transistor arrays with a mobility of as high as 1.26 cm(2)·V(-1)·S(-1) are fabricated by combining the dip-coating process to align the NW into arrays with the inkjet printing process to pattern the source/drain electrodes. A narrow gap of ~20 μm has been obtained by modifying the inkjet process. The all-solution process is proven to be a low-cost, high-yield, simple approach to fabricating high-performance organic NW transistor arrays over a large area 
650 4 |a Journal Article 
650 4 |a Research Support, Non-U.S. Gov't 
700 1 |a Zhou, Yan  |e verfasserin  |4 aut 
700 1 |a Ai, Na  |e verfasserin  |4 aut 
700 1 |a Luo, Chan  |e verfasserin  |4 aut 
700 1 |a Peng, Junbiao  |e verfasserin  |4 aut 
700 1 |a Wang, Jian  |e verfasserin  |4 aut 
700 1 |a Pei, Jian  |e verfasserin  |4 aut 
700 1 |a Cao, Yong  |e verfasserin  |4 aut 
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