Hard X-ray microbeam lithography using a Fresnel zone plate with a long focal length
Focused hard X-ray microbeams for use in X-ray nanolithography have been investigated. A 7.5 keV X-ray beam generated at an undulator was focused to about 3 µm using a Fresnel zone plate fabricated on silicon. The focused X-ray beam retains a high degree of collimation owing to the long focal length...
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Détails bibliographiques
| Publié dans: | Journal of synchrotron radiation. - 1994. - 18(2011), Pt 2 vom: 21. März, Seite 143-7
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| Auteur principal: |
Lee, S Y
(Auteur) |
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| Autres auteurs: |
Cho, I H,
Kim, J M,
Kang, H C,
Noh, D Y |
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| Format: | Article en ligne
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| Langue: | English |
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| Publié: |
2011
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| Accès à la collection: | Journal of synchrotron radiation
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| Sujets: | Journal Article
Research Support, Non-U.S. Gov't |
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