Block copolymer nanolithography : translation of molecular level control to nanoscale patterns
The self-asembly of block copolymers is a promising platform for the "bottom-up" fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use
| Veröffentlicht in: | Advanced materials (Deerfield Beach, Fla.). - 1998. - 21(2009), 47 vom: 18. Dez., Seite 4769-92 |
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| 1. Verfasser: | |
| Weitere Verfasser: | , , , |
| Format: | Online-Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2009
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| Zugriff auf das übergeordnete Werk: | Advanced materials (Deerfield Beach, Fla.) |
| Schlagworte: | Journal Article |
| Zusammenfassung: | The self-asembly of block copolymers is a promising platform for the "bottom-up" fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use |
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| Beschreibung: | Date Completed 29.12.2010 Date Revised 30.09.2020 published: Print Citation Status PubMed-not-MEDLINE |
| ISSN: | 1521-4095 |
| DOI: | 10.1002/adma.200803302 |