Block copolymer nanolithography : translation of molecular level control to nanoscale patterns
The self-asembly of block copolymers is a promising platform for the "bottom-up" fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use
Bibliographische Detailangaben
| Veröffentlicht in: | Advanced materials (Deerfield Beach, Fla.). - 1998. - 21(2009), 47 vom: 18. Dez., Seite 4769-92
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| 1. Verfasser: |
Bang, Joona
(VerfasserIn) |
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| Weitere Verfasser: |
Jeong, Unyong,
Ryu, Du Yeol,
Russell, Thomas P,
Hawker, Craig J |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2009
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| Zugriff auf das übergeordnete Werk: | Advanced materials (Deerfield Beach, Fla.)
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| Schlagworte: | Journal Article |
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