Infrared characterization of interfacial Si-O bond formation on silanized flat SiO2/Si surfaces
Chemical functionalization of silicon oxide (SiO(2)) surfaces with silane molecules is an important technique for a variety of device and sensor applications. Quality control of self-assembled monolayers (SAMs) is difficult to achieve because of the lack of a direct measure for newly formed interfac...
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Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 26(2010), 7 vom: 06. Apr., Seite 4563-6
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| 1. Verfasser: |
Tian, Ruhai
(VerfasserIn) |
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| Weitere Verfasser: |
Seitz, Oliver,
Li, Meng,
Hu, Wenchuang Walter,
Chabal, Yves J,
Gao, Jinming |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2010
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article |
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