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231223s2010 xx |||||o 00| ||eng c |
| 024 |
7 |
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|a 10.1021/la9045447
|2 doi
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|a pubmed24n0648.xml
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|e rakwb
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|a eng
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| 100 |
1 |
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|a Carlberg, Björn
|e verfasserin
|4 aut
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| 245 |
1 |
0 |
|a Direct photolithographic patterning of electrospun films for defined nanofibrillar microarchitectures
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| 264 |
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1 |
|c 2010
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| 336 |
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|a Text
|b txt
|2 rdacontent
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| 337 |
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|a ƒaComputermedien
|b c
|2 rdamedia
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| 338 |
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|a ƒa Online-Ressource
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|2 rdacarrier
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| 500 |
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|a Date Completed 26.04.2010
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|a Date Revised 09.02.2010
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|a published: Print
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|a Citation Status MEDLINE
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|a In this letter, a method of generating spatially defined electrospun microarchitectures by direct photolithographic patterning of electrospun films is described. A photoinitiator, benzoin methyl ether, is incorporated into a solid thermoplastic electrospun polyurethane matrix selectively photo-cross-linked by standard photolithographic methods. Subsequent development in an organic solvent yields spatially defined electrospun microstructures on a single substrate. Utilizing a multilayer approach, the method allows for the assembly of complex hierarchical electrospun structures on single substrates using methods analogous to the conventional microfabrication of solid-state devices
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4 |
|a Journal Article
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4 |
|a Research Support, Non-U.S. Gov't
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|a Coated Materials, Biocompatible
|2 NLM
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| 650 |
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7 |
|a Membranes, Artificial
|2 NLM
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| 650 |
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7 |
|a Polyurethanes
|2 NLM
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| 700 |
1 |
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|a Wang, Teng
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Liu, Johan
|e verfasserin
|4 aut
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| 773 |
0 |
8 |
|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1999
|g 26(2010), 4 vom: 16. Feb., Seite 2235-9
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnns
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| 773 |
1 |
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|g volume:26
|g year:2010
|g number:4
|g day:16
|g month:02
|g pages:2235-9
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4 |
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