Direct photolithographic patterning of electrospun films for defined nanofibrillar microarchitectures
In this letter, a method of generating spatially defined electrospun microarchitectures by direct photolithographic patterning of electrospun films is described. A photoinitiator, benzoin methyl ether, is incorporated into a solid thermoplastic electrospun polyurethane matrix selectively photo-cross...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 26(2010), 4 vom: 16. Feb., Seite 2235-9 |
|---|---|
| 1. Verfasser: | |
| Weitere Verfasser: | , |
| Format: | Online-Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2010
|
| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article Research Support, Non-U.S. Gov't Coated Materials, Biocompatible Membranes, Artificial Polyurethanes |
| Zusammenfassung: | In this letter, a method of generating spatially defined electrospun microarchitectures by direct photolithographic patterning of electrospun films is described. A photoinitiator, benzoin methyl ether, is incorporated into a solid thermoplastic electrospun polyurethane matrix selectively photo-cross-linked by standard photolithographic methods. Subsequent development in an organic solvent yields spatially defined electrospun microstructures on a single substrate. Utilizing a multilayer approach, the method allows for the assembly of complex hierarchical electrospun structures on single substrates using methods analogous to the conventional microfabrication of solid-state devices |
|---|---|
| Beschreibung: | Date Completed 26.04.2010 Date Revised 09.02.2010 published: Print Citation Status MEDLINE |
| ISSN: | 1520-5827 |
| DOI: | 10.1021/la9045447 |