High aspect ratio constructive nanolithography with a photo-dimerizable molecule
A major challenge in constructive nanolithography is the preservation of the lateral resolution of a monolayer-thick template pattern while amplifying it to a structure with a thickness above 10 nm. So far, the most successful approach to achieve this is surface-initiated polymerization (SIP) from e...
| Publié dans: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 26(2010), 5 vom: 02. März, Seite 3623-8 |
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| Auteur principal: | |
| Autres auteurs: | , , , , |
| Format: | Article en ligne |
| Langue: | English |
| Publié: |
2010
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| Accès à la collection: | Langmuir : the ACS journal of surfaces and colloids |
| Sujets: | Journal Article |
| Résumé: | A major challenge in constructive nanolithography is the preservation of the lateral resolution of a monolayer-thick template pattern while amplifying it to a structure with a thickness above 10 nm. So far, the most successful approach to achieve this is surface-initiated polymerization (SIP) from e-beam structured monolayer templates in a multistep process. However, spreading of the polymer on the substrate leads to a rapid line-widening. Therefore, structures with lateral resolutions well below 100 nm and thicknesses above 10 nm (aspect ratio: 0.1) were not reported yet. Our approach of photoinduced, constructive, reversible nanolithography, is based on nanografting within a coumarin-derivative thiol (CDT) solution using the tip of an atomic force microscope (AFM). By photodimerization and the formation of disulfide bonds, the CDT polymerizes in a single-step process. We demonstrate the highest lateral resolution in constructive nanolithography at thicknesses above 10 nm (40 nm lateral resolution at 12 nm thickness, aspect ratio: 0.3) |
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| Description: | Date Completed 28.05.2010 Date Revised 23.02.2010 published: Print Citation Status PubMed-not-MEDLINE |
| ISSN: | 1520-5827 |
| DOI: | 10.1021/la903028x |