High aspect ratio constructive nanolithography with a photo-dimerizable molecule
A major challenge in constructive nanolithography is the preservation of the lateral resolution of a monolayer-thick template pattern while amplifying it to a structure with a thickness above 10 nm. So far, the most successful approach to achieve this is surface-initiated polymerization (SIP) from e...
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Détails bibliographiques
| Publié dans: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 26(2010), 5 vom: 02. März, Seite 3623-8
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| Auteur principal: |
Barczewski, Matthias
(Auteur) |
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| Autres auteurs: |
Walheim, Stefan,
Heiler, Tobias,
Blaszczyk, Alfred,
Mayor, Marcel,
Schimmel, Thomas |
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| Format: | Article en ligne
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| Langue: | English |
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| Publié: |
2010
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| Accès à la collection: | Langmuir : the ACS journal of surfaces and colloids
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| Sujets: | Journal Article |
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