Nanopatterning from the gas phase : high resolution soft lithographic patterning of organosilane thin films
A general methodology for nanopatterning organosilane thin films directly from vapor phase precursors is presented. Aminosilane line patterns with a width of approximately 200 nm in an area of 1 cm(2) were fabricated on silicon substrates by diffusion of aminosilane vapor through the open channels o...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 25(2009), 23 vom: 01. Dez., Seite 13298-301 |
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| Format: | Online-Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2009
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article |
| Online verfügbar |
Volltext |