Selective separation of phosphate and fluoride from semiconductor wastewater
Hydrofluoric acid (HF) and phosphoric acid (H(3)PO(4)) are widely used in semiconductor industry for etching and rinsing purposes. Consequently, significant amount of wastewater containing phosphate and fluoride is generated. Selective separation of phosphate and fluoride from the semiconductor wast...
| Publié dans: | Water science and technology : a journal of the International Association on Water Pollution Research. - 1986. - 59(2009), 10, Seite 2047-53 |
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| Format: | Article en ligne |
| Langue: | English |
| Publié: |
2009
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| Accès à la collection: | Water science and technology : a journal of the International Association on Water Pollution Research |
| Sujets: | Journal Article Research Support, Non-U.S. Gov't Magnesium Compounds Phosphates Phosphoric Acids magnesium phosphate 453COF7817 Ammonia 7664-41-7 Struvite plus... |
| Accès en ligne |
Volltext |