Selective separation of phosphate and fluoride from semiconductor wastewater

Hydrofluoric acid (HF) and phosphoric acid (H(3)PO(4)) are widely used in semiconductor industry for etching and rinsing purposes. Consequently, significant amount of wastewater containing phosphate and fluoride is generated. Selective separation of phosphate and fluoride from the semiconductor wast...

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Bibliographische Detailangaben

Veröffentlicht in:	Water science and technology : a journal of the International Association on Water Pollution Research. - 1986. - 59(2009), 10, Seite 2047-53
1. Verfasser:	Warmadewanthi, B (VerfasserIn)
Weitere Verfasser:	Liu, J C
Format:	Online-Aufsatz
Sprache:	English
Veröffentlicht:	2009
Zugriff auf das übergeordnete Werk:	Water science and technology : a journal of the International Association on Water Pollution Research
Schlagworte:	Journal Article Research Support, Non-U.S. Gov't Magnesium Compounds Phosphates Phosphoric Acids magnesium phosphate 453COF7817 Ammonia 7664-41-7 Struvite mehr... AW3EJL1462 phosphoric acid E4GA8884NN Calcium Chloride M4I0D6VV5M Magnesium Hydroxide NBZ3QY004S Fluorides Q80VPU408O Hydrofluoric Acid RGL5YE86CZ