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231223s2009 xx |||||o 00| ||eng c |
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|a 10.1021/la900601w
|2 doi
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|a eng
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|a Bardea, Amos
|e verfasserin
|4 aut
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|a Submicrometer chemical patterning with high throughput using magnetolithography
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|c 2009
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
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|a ƒa Online-Ressource
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|a Date Completed 23.07.2009
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|a Date Revised 12.05.2009
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|a published: Print
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|a Citation Status PubMed-not-MEDLINE
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|a This letter demonstrates the ability to pattern surfaces chemically with submicrometer resolution by applying the simple and inexpensive magnetolithography (ML) method. This method allows fast patterning of large surfaces without having to face contamination problems or the need to remove the substrate from the solution. With ML it is possible to obtain pattern whose width is narrower than the width of the lines in the mask. By applying the green fluorescent protein (GFP), we were able to probe a 30 nm line of hydrophobic molecules patterned on a substrate coated with a hydrophilic monolayer
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|a Journal Article
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|a Naaman, Ron
|e verfasserin
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1985
|g 25(2009), 10 vom: 19. Mai, Seite 5451-4
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|x 1520-5827
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|g volume:25
|g year:2009
|g number:10
|g day:19
|g month:05
|g pages:5451-4
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|u http://dx.doi.org/10.1021/la900601w
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