Submicrometer chemical patterning with high throughput using magnetolithography
This letter demonstrates the ability to pattern surfaces chemically with submicrometer resolution by applying the simple and inexpensive magnetolithography (ML) method. This method allows fast patterning of large surfaces without having to face contamination problems or the need to remove the substr...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 25(2009), 10 vom: 19. Mai, Seite 5451-4 |
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| Format: | Online-Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2009
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article |
| Online verfügbar |
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