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231223s2009 xx |||||o 00| ||eng c |
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|a 10.1021/la803913e
|2 doi
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|a eng
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|a Lebouin, Chrystelle
|e verfasserin
|4 aut
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|a Evidence of the substrate effect in hydrogen electroinsertion into palladium atomic layers by means of in situ surface X-ray diffraction
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|c 2009
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
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|2 rdamedia
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|a ƒa Online-Ressource
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|a Date Completed 07.07.2009
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|a Date Revised 15.04.2009
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|a published: Print
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|a Citation Status PubMed-not-MEDLINE
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|a In this work, we report an in situ surface X-ray diffraction study of the hydrogen electroinsertion in a two-monolayer equivalent palladium electrodeposit on Pt(111). The role of chloride in the deposition solution in favoring layer-by-layer film growth is evidenced. Three Pd layers are necessary to describe the deposit structure correctly, but the third-layer occupancy is quite low, equal to about 0.22. As a major result, resistance to hydriding of the two atomic Pd layers closest to the Pt interface is observed, which is linked to a strong effect of the Pt(111) substrate. As a consequence, we observe the lowering of the total hydride stoichiometry compared to bulk Pd. Our measurements also reveal good reversibility of the deposit structure, at least toward one hydrogen insertion-desorption cycle
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|a Journal Article
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|a Soldo-Olivier, Yvonne
|e verfasserin
|4 aut
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|a Sibert, Eric
|e verfasserin
|4 aut
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|a De Santis, Maurizio
|e verfasserin
|4 aut
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|a Maillard, Frédéric
|e verfasserin
|4 aut
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|a Faure, René
|e verfasserin
|4 aut
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 25(2009), 8 vom: 21. Apr., Seite 4251-5
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|x 1520-5827
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|g volume:25
|g year:2009
|g number:8
|g day:21
|g month:04
|g pages:4251-5
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|u http://dx.doi.org/10.1021/la803913e
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