Micrometer and nanometer scale patterning using the photo-fries rearrangement : toward selective execution of molecular transformations with nanoscale spatial resolution

The photolithographic modification of monolayers provides a versatile and powerful means of fabricating functionalized nanostructured surfaces. In this contribution, we present photosensitive thiol-bearing aryl ester groups which are capable of undergoing the so-called photo-Fries rearrangement to y...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 24(2008), 21 vom: 04. Nov., Seite 12420-5
1. Verfasser: Griesser, Thomas (VerfasserIn)
Weitere Verfasser: Adams, Joseph, Wappel, Julia, Kern, Wolfgang, Leggett, Graham J, Trimmel, Gregor
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2008
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article
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100 1 |a Griesser, Thomas  |e verfasserin  |4 aut 
245 1 0 |a Micrometer and nanometer scale patterning using the photo-fries rearrangement  |b toward selective execution of molecular transformations with nanoscale spatial resolution 
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520 |a The photolithographic modification of monolayers provides a versatile and powerful means of fabricating functionalized nanostructured surfaces. In this contribution, we present photosensitive thiol-bearing aryl ester groups which are capable of undergoing the so-called photo-Fries rearrangement to yield hydroxyketones. Phenyl 16-mercaptohexadecanoate was prepared by a three-step synthesis. This molecule undergoes a photoisomerization reaction upon illumination with UV light at ca. 250 nm. Subsequently this molecule was applied as a self-assembled monolayer on gold. Following photochemical modification, the adsorbates were selectively derivatized to yield amino-functionalized surfaces using a simple two-step reaction. This reaction was monitored by X-ray photoelectron spectroscopy and contact angle measurements and friction force microscopy. Micrometer-scale patterned surfaces were produced using a contact mask in conjunction with a frequency-doubled argon ion laser (lambda=244 nm). Near-field optical exposure was carried out by coupling the laser to a scanning near-field optical microscope and yielded nanometer-scale resolution. Following derivatization, the resulting structures were analyzed by friction force microscopy. Clear contrast was observed in the friction signal following surface modification 
650 4 |a Journal Article 
700 1 |a Adams, Joseph  |e verfasserin  |4 aut 
700 1 |a Wappel, Julia  |e verfasserin  |4 aut 
700 1 |a Kern, Wolfgang  |e verfasserin  |4 aut 
700 1 |a Leggett, Graham J  |e verfasserin  |4 aut 
700 1 |a Trimmel, Gregor  |e verfasserin  |4 aut 
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