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231223s2008 xx |||||o 00| ||eng c |
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|a 10.1021/la802382p
|2 doi
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|a pubmed24n0610.xml
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|a DE-627
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|e rakwb
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|a eng
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|a Griesser, Thomas
|e verfasserin
|4 aut
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|a Micrometer and nanometer scale patterning using the photo-fries rearrangement
|b toward selective execution of molecular transformations with nanoscale spatial resolution
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|c 2008
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
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|2 rdamedia
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|a ƒa Online-Ressource
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|2 rdacarrier
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|a Date Completed 01.12.2008
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|a Date Revised 30.10.2008
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a The photolithographic modification of monolayers provides a versatile and powerful means of fabricating functionalized nanostructured surfaces. In this contribution, we present photosensitive thiol-bearing aryl ester groups which are capable of undergoing the so-called photo-Fries rearrangement to yield hydroxyketones. Phenyl 16-mercaptohexadecanoate was prepared by a three-step synthesis. This molecule undergoes a photoisomerization reaction upon illumination with UV light at ca. 250 nm. Subsequently this molecule was applied as a self-assembled monolayer on gold. Following photochemical modification, the adsorbates were selectively derivatized to yield amino-functionalized surfaces using a simple two-step reaction. This reaction was monitored by X-ray photoelectron spectroscopy and contact angle measurements and friction force microscopy. Micrometer-scale patterned surfaces were produced using a contact mask in conjunction with a frequency-doubled argon ion laser (lambda=244 nm). Near-field optical exposure was carried out by coupling the laser to a scanning near-field optical microscope and yielded nanometer-scale resolution. Following derivatization, the resulting structures were analyzed by friction force microscopy. Clear contrast was observed in the friction signal following surface modification
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|a Journal Article
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|a Adams, Joseph
|e verfasserin
|4 aut
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|a Wappel, Julia
|e verfasserin
|4 aut
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|a Kern, Wolfgang
|e verfasserin
|4 aut
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|a Leggett, Graham J
|e verfasserin
|4 aut
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|a Trimmel, Gregor
|e verfasserin
|4 aut
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 24(2008), 21 vom: 04. Nov., Seite 12420-5
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnns
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|g volume:24
|g year:2008
|g number:21
|g day:04
|g month:11
|g pages:12420-5
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|u http://dx.doi.org/10.1021/la802382p
|3 Volltext
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