Micrometer and nanometer scale patterning using the photo-fries rearrangement : toward selective execution of molecular transformations with nanoscale spatial resolution
The photolithographic modification of monolayers provides a versatile and powerful means of fabricating functionalized nanostructured surfaces. In this contribution, we present photosensitive thiol-bearing aryl ester groups which are capable of undergoing the so-called photo-Fries rearrangement to y...
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Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 24(2008), 21 vom: 04. Nov., Seite 12420-5
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| 1. Verfasser: |
Griesser, Thomas
(VerfasserIn) |
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| Weitere Verfasser: |
Adams, Joseph,
Wappel, Julia,
Kern, Wolfgang,
Leggett, Graham J,
Trimmel, Gregor |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2008
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article |
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