Rapid micropatterning of mesoporous silica film by site-selective low-energy electron beam irradiation
Rapid microfabrication of mesoporous silica film at low temperature was achieved with low-energy electron beam (LEEB) irradiation. A mesostructured film (thickness approximately 200 nm), which was prepared through hydrolysis and condensation of tetramethoxysilane in the presence of hexadecyltrimethy...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 24(2008), 19 vom: 07. Okt., Seite 11141-6 |
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| Format: | Online-Aufsatz |
| Sprache: | English |
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2008
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article |
| Online verfügbar |
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