Rapid micropatterning of mesoporous silica film by site-selective low-energy electron beam irradiation
Rapid microfabrication of mesoporous silica film at low temperature was achieved with low-energy electron beam (LEEB) irradiation. A mesostructured film (thickness approximately 200 nm), which was prepared through hydrolysis and condensation of tetramethoxysilane in the presence of hexadecyltrimethy...
| Publié dans: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 24(2008), 19 vom: 07. Okt., Seite 11141-6 |
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| Format: | Article en ligne |
| Langue: | English |
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2008
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| Accès à la collection: | Langmuir : the ACS journal of surfaces and colloids |
| Sujets: | Journal Article |
| Accès en ligne |
Volltext |